Simulation of Optical Constants Range of High-Transmittance Attenuated Phase-Shifting Masks Used in KrF Laser and ArF Laser
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- Material Type
- 記事
- Author/Editor
- Eunah KimSeong-yong MooonYong-hoon Kim 他
- Author Heading
- Periodical title
- Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
- No. or year of volume/issue
- 39(11) (通号 529) 2000.11
- Volume
- 39
- Issue
- 11
- Sequential issue number
- 529
- Pages
- 6321～6328