Reaction of Copper Oxide and β-Diketone for In situ Cleaning of Metal Copper in a Copper Chemical Vapor Deposition Reactor

• Material Type: 記事
• Title: Reaction of Copper Oxide and β-Diketone for In situ Cleaning of Metal Copper in a Copper Chemical Vapor Deposition Reactor
• Author/Editor: Atsushi Sekiguchi; Akiko Kobayashi; Tomoaki Koide 他
• Author Heading: Atsushi Sekiguchi; Akiko Kobayashi; Tomoaki Koide
• Periodical title: Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
• No. or year of volume/issue: 39(11) (通号 529) 2000.11
• Volume: 39
• Issue: 11
• Sequential issue number: 529
• Pages: 6478～6486
• Publication date of volume/issue (W3CDTF): 2000-11
• ISSN (Periodical Title): 0021-4922
• ISSN-L (Periodical Title): 0021-4922
• Publication (Periodical Title): Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
• Place of Publication (Country Code): JP
• Text Language Code: eng
• Subject Heading: Cu-CVD; 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; bis-hexafluoroacetylacetonate copper; thermogravimetry; Arrhenius plot; weight ratio etching rate; vaporization rate
• NDLC: ZM35
• Target Audience: 一般
• Collection (particular): 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌; https://dl.ndl.go.jp/collections/A00002
• Access Restrictions: 国立国会図書館内限定公開
• Service for the Digitized Contents Transmission Service: 図書館・個人送信対象
• Availability of remote photoduplication service: 可
• Holding library: 国立国会図書館
• Call No.: Z53-A375
• Periodical Title (Persistent ID (NDL)): info:ndljp/pid/11196223; https://dl.ndl.go.jp/pid/11196223
• Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 5577013; http://id.ndl.go.jp/bib/5577013
• Bibliographic Record Category (NDL): 632

• Summary, etc.: For <I>in situ</I> cleaning of inner reactor walls of copper chemical vapor deposition chambers used in the copper wiring process of LSI, etching of t...