シリコン融液表面のアルゴンガス流れと単結晶中の酸素濃度(小特集バルク成長分科会特集--結晶成長時における気液界面の物質移動と結晶に与える影響)

Journal name: 日本結晶成長学会誌 = Journal of the Japanese Association for Crystal Growth 27(5) 2000

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Material Type: 記事
Title: シリコン融液表面のアルゴンガス流れと単結晶中の酸素濃度
Author/Editor: 町田倫久
干川圭吾
清水保雄
Series Title: 小特集バルク成長分科会特集--結晶成長時における気液界面の物質移動と結晶に与える影響
Author Heading: 町田倫久
干川圭吾
清水保雄
Periodical title: 日本結晶成長学会誌 = Journal of the Japanese Association for Crystal Growth
No. or year of volume/issue: 27(5) 2000
Volume: 27
Issue: 5
Pages: 275～280
Publication date of volume/issue (W3CDTF): 2000
ISSN (Periodical Title): 0385-6275
ISSN-L (Periodical Title): 0385-6275
Publication (Periodical Title): 大阪 : 日本結晶成長学会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZM35
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z15-339
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 5597556
http://id.ndl.go.jp/bib/5597556
Bibliographic Record Category (NDL): 632