Anomalous Surface Amorphization of Si(001) Induced by 3-5keV Ar〔+〕 Ion Bombardment

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Anomalous Surface Amorphization of Si(001) Induced by 3-5keV Ar〔+〕 Ion Bombardment

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
5760638
Material type
記事
Author
Kaoru Nakajimaほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2001-04
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 40(4A) (通号 537) 2001.4
Publication Page
p.2119~2122
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Detailed bibliographic record

Summary, etc.:

The process of amorphization of Si(001) by 3–5 keV Ar<FONT SIZE="-1"><SUP>+</SUP></FONT> ion bombardment is investigated using high-resolution Rutherf...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Kaoru Nakajima
Hisami Toyofuku
Kenji Kimura
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
40(4A) (通号 537) 2001.4
Volume
40
Issue
4A
Sequential issue number
537
Pages
2119~2122