Atomic Layer Deposition- and Chemical Vapor Deposition-TiN Top Electrode Optimization for the Reliability of Ta2O5 and Al2O3 Metal Insulator Silicon Capacitor for 0.13μm Technology and Beyond (Solid State Devices & Materials)
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- Material Type
- 記事
- Author/Editor
- Hyun Seok LimSang Bom KanagIn Sang Jeon 他
- Series Title
- Author Heading
- Periodical title
- Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
- No. or year of volume/issue
- 40(4B) (通号 538) (増刊) 2001.4
- Volume
- 40
- Issue
- 4B
- Sequential issue number
- 538