Direct Measurement of Resist Pattern Adhesion on the Surface with Silane-coupling Treatment by Atomic Force Microscope(AFM)

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Direct Measurement of Resist Pattern Adhesion on the Surface with Silane-coupling Treatment by Atomic Force Microscope(AFM)

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Material Type: 記事
Title: Direct Measurement of Resist Pattern Adhesion on the Surface with Silane-coupling Treatment by Atomic Force Microscope(AFM)
Author/Editor: Akira Kawai
Takato Abe
Author Heading: Akira Kawai
Takato Abe
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 14(4) 2001
Volume: 14
Issue: 4
Pages: 513～518
Publication date of volume/issue (W3CDTF): 2001
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: peeling
surface energy
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 5833435
http://id.ndl.go.jp/bib/5833435
Bibliographic Record Category (NDL): 632