Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process

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Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process

Call No. (NDL): Z53-A375
Bibliographic ID of National Diet Library: 5985646

Material type: 記事

Author: Akira Chibaほか

Publisher: Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

Publication date: 2001-11

Material Format: Digital

Journal name: Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 40(11) (通号 548) 2001.11

Publication Page: p.6208～6211

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Detailed bibliographic record

Summary, etc.：: Experiments and numerical calculations were performed to investigate the dry etching heating of mask substrate. Changes of the glass substrate tempera...

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Material Type: 記事
Title: Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process
Author/Editor: Akira Chiba
Eiichi Hoshino
Masashi Takahashi 他
Author Heading: Akira Chiba
Eiichi Hoshino
Masashi Takahashi
Periodical title: Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue: 40(11) (通号 548) 2001.11
Volume: 40
Issue: 11
Sequential issue number: 548
Pages: 6208～6211
Publication date of volume/issue (W3CDTF): 2001-11
ISSN (Periodical Title): 0021-4922
ISSN-L (Periodical Title): 0021-4922
Publication (Periodical Title): Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: EUVL mask blank etching
ECR
temperature rise
glass substrate
Si wafer
simulation
thermal balance equation
conduction
radiation
NDLC: ZM35
Target Audience: 一般
Collection (particular): 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌
https://dl.ndl.go.jp/collections/A00002
Access Restrictions: 国立国会図書館内限定公開
Service for the Digitized Contents Transmission Service: 図書館・個人送信対象
Availability of remote photoduplication service: 可
Holding library: 国立国会図書館
Call No.: Z53-A375
Periodical Title (Persistent ID (NDL)): info:ndljp/pid/11226617
https://dl.ndl.go.jp/pid/11226617
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 5985646
http://id.ndl.go.jp/bib/5985646
Bibliographic Record Category (NDL): 632