Substrate Bias Effect on Amorphous Hydrogenated Carbon Films Deposited by Filtered Cathodic Arc Deposition

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Substrate Bias Effect on Amorphous Hydrogenated Carbon Films Deposited by Filtered Cathodic Arc Deposition

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
5986354
Material type
記事
Author
Yan-Way Liほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2001-11
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 40(11) (通号 548) 2001.11
Publication Page
p.6574~6580
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Detailed bibliographic record

Summary, etc.:

In the present study, we briefly describe the 45<FONT SIZE="-1"><SUP>º</SUP></FONT> angle magnetic filtered arc deposition (FAD) process and investiga...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Yan-Way Li
Chia-Fu Chen
Yew-Bin Shue 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
40(11) (通号 548) 2001.11
Volume
40
Issue
11
Sequential issue number
548
Pages
6574~6580