光散乱パターンを用いたシリコンウエハ加工表面欠陥のインプロセス計測に関する研究(第2報)高速欠陥計測法の提案

Journal name: 精密工学会誌 = Journal of the Japan Society for Precision Engineering / 会誌編集委員会編 68(7) (通号 811) 2002.7

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Material Type: 記事
Title: 光散乱パターンを用いたシリコンウエハ加工表面欠陥のインプロセス計測に関する研究(第2報)高速欠陥計測法の提案
Author/Editor: 高橋哲
三好隆志
高谷裕浩他
Author Heading: 高橋哲
三好隆志
高谷裕浩
Periodical title: 精密工学会誌 = Journal of the Japan Society for Precision Engineering / 会誌編集委員会編
No. or year of volume/issue: 68(7) (通号 811) 2002.7
Volume: 68
Issue: 7
Sequential issue number: 811
Pages: 962～966
Publication date of volume/issue (W3CDTF): 2002-07
ISSN (Periodical Title): 0912-0289
ISSN-L (Periodical Title): 0912-0289
Publication (Periodical Title): 東京 : 精密工学会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: silicon wafer
surface defects
in-process measurement
Laser Scattered Defect Pattern
NDLC: ZN12
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-466
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 6217092
http://id.ndl.go.jp/bib/6217092
Bibliographic Record Category (NDL): 632