Optimization of 193nm Contact Hole Resists for 100nm Node

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Material Type: 記事
Title: Optimization of 193nm Contact Hole Resists for 100nm Node
Author/Editor: Takanori Kudo
Eric L. Alemy
Ralph R. Dammel 他
Author Heading: Takanori Kudo
Eric L. Alemy
Ralph R. Dammel
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 15(4) 2002
Volume: 15
Issue: 4
Pages: 549～558
Publication date of volume/issue (W3CDTF): 2002
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: acid diffusion
illumination
resist components
AZ AX 1050P
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 6219450
http://id.ndl.go.jp/bib/6219450
Bibliographic Record Category (NDL): 632