ELFIN(ELevated Field INsulator) and SEP(S/D Elevated by Poly-Si Plugging) Process for Ultra-Thin SOI MOSFETs (AWAD2002(Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))

ELFIN(ELevated Field INsulator) and SEP(S/D Elevated by Poly-Si Plugging) Process for Ultra-Thin SOI MOSFETs

(AWAD2002(Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))

Call No. (NDL): Z16-940
Bibliographic ID of National Diet Library: 6266737

Material type: 記事

Author: Jong-Wook Leeほか

Publisher: 東京 : 電子情報通信学会

Publication date: 2002-07-01

Material Format: Paper

Journal name: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 102(175) 2002.7.1

Publication Page: p.9～12

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Paper

Material Type: 記事
Title: ELFIN(ELevated Field INsulator) and SEP(S/D Elevated by Poly-Si Plugging) Process for Ultra-Thin SOI MOSFETs
Author/Editor: Jong-Wook Lee
Yukisige Saitoh
Risho Koh 他
Series Title: AWAD2002(Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices)
Author Heading: Jong-Wook Lee
Yukisige Saitoh
Risho Koh
Periodical title: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue: 102(175) 2002.7.1
Volume: 102
Issue: 175
Pages: 9～12
Publication date of volume/issue (W3CDTF): 2002-07-01
ISSN (Periodical Title): 0913-5685
ISSN-L (Periodical Title): 0913-5685
Publication (Periodical Title): 東京 : 電子情報通信学会
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: Thin-film SOI MOSFET
Device Isolation
Reverse Narrow Channel Effect
NDLC: ZN33
Target Audience: 一般
Report No. (Article): ED2002-118
Holding library: 国立国会図書館
Call No.: Z16-940
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 6266737
http://id.ndl.go.jp/bib/6266737
Bibliographic Record Category (NDL): 632