Passivation and Etching of Wafer Surfaces in HF-H2O2-IPA Solutions

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Passivation and Etching of Wafer Surfaces in HF-H2O2-IPA Solutions

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
6333942
Material type
記事
Author
Dae-Hong Eomほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2002-10
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 41(10) (通号 565) 2002.10
Publication Page
p.5881~5886
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Detailed bibliographic record

Summary, etc.:

The etching behavior of silicon and oxide wafers was evaluated in HF solutions with and without the addition of H<FONT SIZE="-1"><SUB>2</SUB></FONT>O<...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Dae-Hong Eom
Ky-Sub Kim
Jin-Goo Park
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
41(10) (通号 565) 2002.10
Volume
41
Issue
10
Sequential issue number
565
Pages
5881~5886