Copper Distribution near a SiO2/Si Interface under Low-Temperature Annealing
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- Material Type
- 記事
- Author/Editor
- Kazuyuki HozawaSeiichi IsomaeJiro Yugami
- Author Heading
- Periodical title
- Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
- No. or year of volume/issue
- 41(10) (通号 565) 2002.10
- Volume
- 41
- Issue
- 10
- Sequential issue number
- 565
- Pages
- 5887～5893