Si半導体ウエハの放射率挙動の測定(第19回センシングフォーラム--センシング技術の新たな展開と融合資料 ; セッションWC1 温度・流体・化学計測)

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Material Type: 記事
Title: Si半導体ウエハの放射率挙動の測定
Author/Editor: 福島忠和
大久保智裕
井内徹
Series Title: 第19回センシングフォーラム--センシング技術の新たな展開と融合資料 ; セッションWC1 温度・流体・化学計測
Author Heading: 福島忠和
大久保智裕
井内徹
Periodical title: センシングフォーラム資料
No. or year of volume/issue: 19 2002.9.17・18
Volume: 19
Pages: 347～350
Publication date of volume/issue (W3CDTF): 2002-09
ISSN (Periodical Title): 1343-7631
ISSN-L (Periodical Title): 1343-7631
Publication (Periodical Title): 東京 : 計測自動制御学会計測部門
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: Emissivity
Silicon semiconductor wafer
Thin film
NDLC: ZM15
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z14-2000
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 6578993
http://id.ndl.go.jp/bib/6578993
Bibliographic Record Category (NDL): 632