Effect of Slurry Surfactant on Nanotopography Impact in Chemical Mechanical Polishing

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Effect of Slurry Surfactant on Nanotopography Impact in Chemical Mechanical Polishing

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
6684867
Material type
記事
Author
Takeo Katohほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2003-09
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 42(9A) (通号 582) 2003.9
Publication Page
p.5430~5432
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Detailed bibliographic record

Summary, etc.:

The effect of surfactant in a ceria slurry on the impact of nanotopography on post-CMP oxide thickness deviation (OTD) was investigated in a blanket w...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Takeo Katoh
Sung-Jun Kim
Ungyu Paik 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
42(9A) (通号 582) 2003.9
Volume
42
Issue
9A
Sequential issue number
582
Pages
5430~5432