Electron Dynamics in Chemically Amplified Resists

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Material Type: 記事
Title: Electron Dynamics in Chemically Amplified Resists
Author/Editor: Takahiro Kozawa
Hiroki Yamamoto
Atsuro Nakano 他
Author Heading: Takahiro Kozawa
Hiroki Yamamoto
Atsuro Nakano
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 17(3) 2004
Volume: 17
Issue: 3
Pages: 449～452
Publication date of volume/issue (W3CDTF): 2004
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: electron dynamics
electron beam lithography
chemically amplified resist
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 6981374
http://id.ndl.go.jp/bib/6981374
Bibliographic Record Category (NDL): 632