Bibliographic Record
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- Material Type
- 記事
- Author/Editor
- 山崎 崇大見 俊一郎盛田 伸也 他
- Series Title
- Alternative Title
- 極薄SOI層と素子間分離領域の形成を一体化する新技術:SBSI--SiGe選択エッチング特性の硝酸濃度依存性
- Periodical title
- 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
- No. or year of volume/issue
- 104(155) 2004.6.30
- Volume
- 104
- Issue
- 155