ウェットプロセス膜の...

ウェットプロセス膜の低エネルギーArイオン照射による高性能化

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ウェットプロセス膜の低エネルギーArイオン照射による高性能化

Call No. (NDL)
Z14-864
Bibliographic ID of National Diet Library
7351004
Material type
記事
Author
佐々木 智憲ほか
Publisher
東京 : 日本材料試験技術協会
Publication date
2005-04
Material Format
Paper
Journal name
材料試験技術 = Journal of Material Testing Research Association of Japan 50(2) 2005.4
Publication Page
p.64~68
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Paper

Material Type
記事
Author/Editor
佐々木 智憲
楊 明
Periodical title
材料試験技術 = Journal of Material Testing Research Association of Japan
No. or year of volume/issue
50(2) 2005.4
Volume
50
Issue
2
Pages
64~68
Publication date of volume/issue (W3CDTF)
2005-04