超高密度・極微細シリコンナノドットの形成技術とメモリ特性 (特集1 次世代不揮発メモリーの開発・高集積化とその市場)
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- Material Type
- 記事
- Author/Editor
- 財満 鎭明内藤 慎哉近藤 博基 他
- Series Title
- Periodical title
- Material stage / 技術情報協会 編
- No. or year of volume/issue
- 5(3) (通号 51) 2005.6
- Volume
- 5
- Issue
- 3
- Sequential issue number
- 51