172nmの真空紫外光照射によるポリメチルメタクリレート表面の化学構造変化の評価

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Material Type: 記事
Title: 172nmの真空紫外光照射によるポリメチルメタクリレート表面の化学構造変化の評価
Author/Editor: 山口隆彦
浅倉秀一
不破章雄
Author Heading: 山口隆彦
浅倉秀一
不破章雄
Periodical title: マテリアルライフ学会誌
No. or year of volume/issue: 17(4) 2005.10
Volume: 17
Issue: 4
Pages: 140～145
Publication date of volume/issue (W3CDTF): 2005-10
ISSN (Periodical Title): 1346-0633
ISSN-L (Periodical Title): 1346-0633
Publication (Periodical Title): 東京 : マテリアルライフ学会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: FT-IR-RAS
XPS
フォトレジスト
Vacuum ultraviolet (VUV) light
poly (methyl-methacrylat)
PMMA
FTIR-RAS
photoresist
NDLC: ZM16
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z14-1501
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 7716366
http://id.ndl.go.jp/bib/7716366
Bibliographic Record Category (NDL): 632