イオン照射によりSi基板に導入された格子歪みの深さ方向分布の解析

Journal name: 放射光 : 日本放射光学会誌 = Journal of the Japanese Society for Synchrotron Radiation Research / 日本放射光学会編 19(3) 2006.5

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Material Type: 記事
Title: イオン照射によりSi基板に導入された格子歪みの深さ方向分布の解析
Author/Editor: 榎本貴志
Parlapalli Venkata Satyam
秋本晃一
Author Heading: 榎本貴志
Parlapalli Venkata Satyam
秋本晃一
Periodical title: 放射光 : 日本放射光学会誌 = Journal of the Japanese Society for Synchrotron Radiation Research / 日本放射光学会編
No. or year of volume/issue: 19(3) 2006.5
Volume: 19
Issue: 3
Pages: 151～158
Publication date of volume/issue (W3CDTF): 2006-05
ISSN (Periodical Title): 0914-9287
ISSN-L (Periodical Title): 0914-9287
Publication (Periodical Title): 大阪 : 日本放射光学会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZM35
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z15-561
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 7978151
http://id.ndl.go.jp/bib/7978151
Bibliographic Record Category (NDL): 632