Joule-Heating-Induced Annealing by Applying Electric Field Directly to Intrinsic Silicon Film

Journal name: Japanese journal of applied physics. Part 2, Letters & express letters 45(42-45) (通号 447) 2006.11

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Material Type: 記事
Title: Joule-Heating-Induced Annealing by Applying Electric Field Directly to Intrinsic Silicon Film
Author/Editor: Jae-Sang Ro
Won-Eui Hong
Author Heading: Jae-Sang Ro
Won-Eui Hong
Periodical title: Japanese journal of applied physics. Part 2, Letters & express letters
No. or year of volume/issue: 45(42-45) (通号 447) 2006.11
Volume: 45
Issue: 42-45
Sequential issue number: 447
Pages: L1142～1145
Publication date of volume/issue (W3CDTF): 2006-11
ISSN (Periodical Title): 0021-4922
ISSN-L (Periodical Title): 0021-4922
Publication (Periodical Title): Tokyo : Japan Society of Applied Physics
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: Joule heating
crystallization
thin-film transistor
NDLC: ZM35
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z54-J337
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 8548254
http://id.ndl.go.jp/bib/8548254
Bibliographic Record Category (NDL): 632