多層配線デバイス製造...

多層配線デバイス製造を支える最新のCMP平坦化技術 (特集 半導体デバイスの平坦化技術)

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多層配線デバイス製造を支える最新のCMP平坦化技術(特集 半導体デバイスの平坦化技術)

Call No. (NDL)
Z16-466
Bibliographic ID of National Diet Library
8890468
Material type
記事
Author
辻村 学
Publisher
東京 : 精密工学会
Publication date
2007-07
Material Format
Paper
Journal name
精密工学会誌 = Journal of the Japan Society for Precision Engineering / 会誌編集委員会 編 73(7) (通号 871) 2007.7
Publication Page
p.760~763
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Paper Digital

Material Type
記事
Author/Editor
辻村 学
Author Heading
Alternative Title
CMP technology for interconnect of semiconductor device
Periodical title
精密工学会誌 = Journal of the Japan Society for Precision Engineering / 会誌編集委員会 編
No. or year of volume/issue
73(7) (通号 871) 2007.7
Volume
73
Issue
7