基板バイアススパッタ法によるITO薄膜の検討(2) (電子部品・材料)

基板バイアススパッタ法によるITO薄膜の検討(2)

(電子部品・材料)

Journal name: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 107(178) 2007.8.9・10

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Material Type: 記事
Title: 基板バイアススパッタ法によるITO薄膜の検討(2)
Author/Editor: 梅津岳
中田悠介
清水英彦他
Series Title: 電子部品・材料
Author Heading: 梅津岳
中田悠介
清水英彦
Alternative Title: Examination of ITO thin films deposited by substrate bias sputtering (2)
Periodical title: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue: 107(178) 2007.8.9・10
Volume: 107
Issue: 178
Pages: 33～38
Publication date of volume/issue (W3CDTF): 2007-08
ISSN (Periodical Title): 0913-5685
ISSN-L (Periodical Title): 0913-5685
Publication (Periodical Title): 東京 : 電子情報通信学会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: ITO薄膜
RF-DC結合型スパッタ法
基板バイアススパッタ法
低温
ITO thin film
RF-DC coupled magnetron sputtering method
substrate bias sputtering
low temperature
NDLC: ZN33
Target Audience: 一般
Report No. (Article): CPM2007-42
Holding library: 国立国会図書館
Call No.: Z16-940
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 8895773
http://id.ndl.go.jp/bib/8895773
Bibliographic Record Category (NDL): 632