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CiNii Research
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Bibliographic Record
You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.
- Material Type
- 記事
- Author/Editor
- 平野 泉山口 豪関根 克行
- Alternative Title
- Degradation mechanism and lifetime projection of HfSiON as alternative high-k gate dielectric
- Periodical title
- 東芝レビュー = Toshiba review / 東芝ビジネスエキスパート株式会社ビジネスソリューション事業部 編集・制作
- No. or year of volume/issue
- 62(7) (通号 697) 2007.7
- Volume
- 62
- Issue
- 7
- Sequential issue number
- 697