次世代半導体製造プロセスにおける金属不純物汚染制御--新規材料元素の拡散挙動予測

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次世代半導体製造プロセスにおける金属不純物汚染制御--新規材料元素の拡散挙動予測

Call No. (NDL)
Z16-607
Bibliographic ID of National Diet Library
8916840
Material type
記事
Author
嶋崎 綾子ほか
Publisher
東京 : 電子情報通信学会エレクトロニクスソサイエティ
Publication date
2007-08
Material Format
Paper
Journal name
電子情報通信学会論文誌. C, エレクトロニクス = The IEICE transactions on electronics. C / 電子情報通信学会 編 90(8) (通号 476) 2007.8
Publication Page
p.600~607
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Paper

Material Type
記事
Author/Editor
嶋崎 綾子
桜井 宏紀
吉村 玲子 他
Alternative Title
Contamination control of metallic impurities in ULSI manufacturing process: diffusion behavior of new material elements
Periodical title
電子情報通信学会論文誌. C, エレクトロニクス = The IEICE transactions on electronics. C / 電子情報通信学会 編
No. or year of volume/issue
90(8) (通号 476) 2007.8
Volume
90
Issue
8
Sequential issue number
476