Oxime sulfonate chemistry for advanced microlithography

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Material Type: 記事
Title: Oxime sulfonate chemistry for advanced microlithography
Author/Editor: Hitoshi Yamato
Toshikage Asakura
Yuichi Nishimae 他
Author Heading: Hitoshi Yamato
Toshikage Asakura
Yuichi Nishimae
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 20(5) 2007
Volume: 20
Issue: 5
Pages: 637～642
Publication date of volume/issue (W3CDTF): 2007
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: oxime sulfonate
photoacid generator
g-line
i-line
KrF
ArF
chemically amplified resist
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 8918824
http://id.ndl.go.jp/bib/8918824
Bibliographic Record Category (NDL): 632