Simulation of the time evolution profiles in nanoimprint lithography

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Material Type: 記事
Title: Simulation of the time evolution profiles in nanoimprint lithography
Author/Editor: Toshiaki Tanabe
Masaaki Nishihara
Hiroyuki Kawata 他
Author Heading: Toshiaki Tanabe
Masaaki Nishihara
Hiroyuki Kawata
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 20(4) 2007
Volume: 20
Issue: 4
Pages: 573～576
Publication date of volume/issue (W3CDTF): 2007
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: nanoimprint
resist
process time
time dependence
time evolution
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 8919393
http://id.ndl.go.jp/bib/8919393
Bibliographic Record Category (NDL): 632