記事

半導体用高純度シリコン生成反応に於ける熱力学的検討

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半導体用高純度シリコン生成反応に於ける熱力学的検討

Call No. (NDL)
Z572.4-To1
Bibliographic ID of National Diet Library
9122653
Material type
記事
Author
和久 友夫 他
Publisher
藤沢 : 東海電極製造技術研究所
Publication date
1961-02
Material Format
Paper
Journal name
東海電極技報 21(1) 1961.02
Publication Page
p.25~30
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Paper

Material Type
記事
Author/Editor
和久 友夫 他
Author Heading
Periodical title
東海電極技報
No. or year of volume/issue
21(1) 1961.02
Volume
21
Issue
1
Pages
25~30
Publication date of volume/issue (W3CDTF)
1961-02