パルスレーザー堆積法...

パルスレーザー堆積法による複酸化物薄膜のエピタキシー (特集 高品質エピタキシャル薄膜の作製・デバイス化)

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パルスレーザー堆積法による複酸化物薄膜のエピタキシー

(特集 高品質エピタキシャル薄膜の作製・デバイス化)

Call No. (NDL)
Z14-909
Bibliographic ID of National Diet Library
9366075
Material type
記事
Author
大西 剛
Publisher
東京 : シーエムシー出版
Publication date
2008-03
Material Format
Paper
Journal name
機能材料 28(3) (通号 319) 2008.3
Publication Page
p.6~14
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Paper

Material Type
記事
Author/Editor
大西 剛
Author Heading
Alternative Title
Epitaxial growth of complex oxide thin films by pulsed laser deposition
Periodical title
機能材料
No. or year of volume/issue
28(3) (通号 319) 2008.3
Volume
28
Issue
3