励起状酸素を用いたシリコン低温酸化の大型基板酸化への適用(第48回真空に関する連合講演会プロシーディングス--2007年11月14日～16日,東京)

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

CiNii Research
Search Service
Digital
You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.
Check the holdings of this book

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 記事
Title: 励起状酸素を用いたシリコン低温酸化の大型基板酸化への適用
Author/Editor: 亀田直人
斉藤茂
西口哲也他
Series Title: 第48回真空に関する連合講演会プロシーディングス--2007年11月14日～16日,東京
Author Heading: 亀田直人
斉藤茂
西口哲也
Alternative Title: Application of UV-light excited ozone to large-sized Si wafer at low temperature
Periodical title: Journal of the Vacuum Society of Japan = 真空
No. or year of volume/issue: 51(3) 2008.3
Volume: 51
Issue: 3
Pages: 228～231
Publication date of volume/issue (W3CDTF): 2008-03
ISSN (Periodical Title): 1882-2398
ISSN-L (Periodical Title): 1882-2398
Publication (Periodical Title): 東京 : 日本真空協会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN15
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-474
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 9471678
http://id.ndl.go.jp/bib/9471678
Bibliographic Record Category (NDL): 632