プラズマCVD法による希土類添加シリカ薄膜--成膜法の開発と発光の物性研究への応用

Journal name: 電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials 119(1) 1999.01

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Material Type: 記事
Title: プラズマCVD法による希土類添加シリカ薄膜--成膜法の開発と発光の物性研究への応用
Author/Editor: 四元茂之
酒井真吾
大木義路
Author Heading: 四元茂之
酒井真吾
大木義路
Periodical title: 電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials
No. or year of volume/issue: 119(1) 1999.01
Volume: 119
Issue: 1
Pages: 113～117
Publication date of volume/issue (W3CDTF): 1999-01
ISSN (Periodical Title): 0385-4205
ISSN-L (Periodical Title): 0385-4205
Publication (Periodical Title): 東京 : 電気学会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN31
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-793
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 971643
http://id.ndl.go.jp/bib/971643
Bibliographic Record Category (NDL): 632