熱CVD法によるSiO_2薄膜生成過程における熱物質移動解析および粉体生成を伴った新規反応モデルの提案

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Material Type: 博士論文
Title: 熱CVD法によるSiO_2薄膜生成過程における熱物質移動解析および粉体生成を伴った新規反応モデルの提案
Title Transcription: ネツ CVD ホウニヨル SiO2 ウスマクセイセイカテイニオケルネツブッシツイドウカイセキオヨビフンタイセイセイオトモナッタシンキハンノウモデルノテイアン
Author/Editor: 本田, 美咲
Author Heading: 本田, 美咲
Alternative Title: Heat and mass transfer analysis during the formation process of SiO_2 thin solid film by thermal chemical vapor deposition and proposal of new chemical reaction model with particle generation
Degree grantor/type: 山口大学
Date Granted: 2022-03-16
Dissertation Number: 創科博甲第83号
Degree Type: 博士(工学)
Text Language Code: jpn
Target Audience: 一般
Format (IMT): application/pdf
Source: fulltext
https://petit.lib.yamaguchi-u.ac.jp/29061/files/166548
Access Restrictions: インターネット公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 山口大学 : 山口大学学術機関リポジトリYUNOCA