Continuous monitoring of back wall stress corrosion cracking growth in sensitized type 304 stainless steel weldment by means of potential drop techniques

Material type: 文書・図像類

Author: SATO, Yほか

Publisher: Elsevier Ltd

Publication date: 2007-05

Material Format: Digital

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Note (General)：: Stress corrosion cracking (SCC) tests on welded specimens of sensitized type 304SS with a thickness of 20 mm were performed in sodium thiosulphate sol...

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Material Type: 文書・図像類
Title: Continuous monitoring of back wall stress corrosion cracking growth in sensitized type 304 stainless steel weldment by means of potential drop techniques
Author/Editor: SATO, Y
ATSUMI, T
SHOJI, T
Author Heading: SATO, Y
ATSUMI, T
SHOJI, T
Publication, Distribution, etc.: Elsevier Ltd
Publication Date: 2007-05
Publication Date (W3CDTF): 2007-05
Periodical title: International Journal of Pressure Vessels and Piping
No. or year of volume/issue: 84 5
Volume: 84
Issue: 5
Pages: 274-283
Text Language Code: eng
Subject Heading: Stress corrosion cracking
Sensitized stainless steel
Continuous monitoring
Potential drop
Target Audience: 一般
Note (General): Stress corrosion cracking (SCC) tests on welded specimens of sensitized type 304SS with a thickness of 20 mm were performed in sodium thiosulphate solution at room temperature, with continuous monitoring of the SCC growth, using the techniques of modified induced current potential drop (MICPD), alternating current potential drop (ACPD) and direct current potential drop (DCPD). The MICPD and DCPD techniques permit continuous monitoring of the back wall SCC, which initiates from a fatigue pre-crack at a depth of about 4 mm, from which it propagates through more than 80% of the specimen thickness. The MICPD technique can decrease the effect of the current flowing in the direction of the crack length by focusing the induced current into the local area of measurement using induction coils, so that the sensitivity of the continuous monitoring of the back wall SCC is higher than that of the ACPD and DCPD techniques.
Source: https://u-fukui.repo.nii.ac.jp/?action=repository_action_common_download&item_id=22260&item_no=1&attribute_id=22&file_no=1
https://u-fukui.repo.nii.ac.jp/?action=repository_action_common_download&item_id=22260&item_no=1&attribute_id=22&file_no=1
Access Restrictions: 限定公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 福井大学 : 福井大学学術機関リポジトリ