ゾル-ゲル法によるポリブチレンテレフタレート材へのシリカ/ポリメチルメタクリレートハイブリッド薄膜の作製及びその性質

• Material Type: 文書・図像類
• Title: ゾル-ゲル法によるポリブチレンテレフタレート材へのシリカ/ポリメチルメタクリレートハイブリッド薄膜の作製及びその性質
• Author/Editor: 下村, 順子; 荻原, 隆; 小形, 信男; 幸塚, 広光; 加藤, 一実; 鈴木, 久男; SHIMOMURA, Junko; OGIHARA, Takashi; OGATA, Nobuo; KOZUKA, Hiromitsu; KATO, Kazumi; SUZUKI, Hisao
• Author Heading: 下村, 順子; 荻原, 隆; 小形, 信男; 幸塚, 広光; 加藤, 一実; 鈴木, 久男; SHIMOMURA, Junko; OGIHARA, Takashi; OGATA, Nobuo; KOZUKA, Hiromitsu; KATO, Kazumi; SUZUKI, Hisao
• Publication, Distribution, etc.: 社団法人日本セラミックス協会
• Publication Date: 2007-09
• Publication Date (W3CDTF): 2007-09
• Alternative Title: Preparation and Characterization of Silica/Polymethylmethacrylate Hybirid Thin Films on PoIybutyleneterephthalate Substrates by Sol-Gel Method.
• Periodical title: Journal of Ceramic Society of Japan
• No. or year of volume/issue: 115 9
• Volume: 115
• Issue: 9
• Pages: 556-561
• ISSN (Periodical Title): ISSN : 1882-0743
• Text Language Code: jpn
• Subject Heading: Sol-gel; Silica; Polysilazane; Coating; Hybrid film
• Target Audience: 一般
• Note (General): Silica and silica/polymethylmethacrylate (PMMA) hybrid thin films 0.15-0.9 μm in thickness were deposited on polybutyleneterephthalate (PBT) substrates by dip-coating followed by heat-treatment at 170° or 180℃, using perhydropolysilazane (PHPS) and tetraethylorthosilicate (TEOS) as a silica source. A contamination test was carried out using curry as a contaminant; the curry was placed on the thin film samples, heated at 150℃, and then removed with neutral detergent, followed by microscopic observation and color difference measurement. Coating with silica either using TEOS or PHPS was effective in suppressing the contamination, where the latter was found to be more effective than the former. Although the as-prepared silica and silica/PMMA hybrid thin films were crack-free, the films tended to be cracked when subjected to the contamination test, which was more significant for those prepared at higher substrate withdrawal speeds. The cracking tendency, however, was found to decrease when silica was hybridized with PMMA, and no cracks were observed on the contamination test for the sample prepared at PMMA/PHPS mass ratios higher than 1.2. The degree of contamination was minimized at a PMMA/PHPS mass ratio of 0.8, where excellent adhesion was also found between the film and the substrate.
• Access Restrictions: 限定公開
• Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）; https://irdb.nii.ac.jp
• Original Data Provider (Database): 福井大学 : 福井大学学術機関リポジトリ