シリコン基板の熱酸化機構

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Material Type: 図書
Title: シリコン基板の熱酸化機構
Author/Editor: 須佐, 匡裕
Susa, Masahiro
Author Heading: 須佐, 匡裕
Susa, Masahiro
Publication Date: 1990
Publication Date (W3CDTF): 1990
Alternative Title: Mechanism of Thermal Oxidation of Silicon Substrates
Periodical title: 日本金属学会誌
No. or year of volume/issue: 54 No. 1
Volume: 54
Issue: No. 1
Pages: 33-
ISSN (Periodical Title): ISSN : 0021-4876
Text Language Code: eng
Target Audience: 一般
Note (General): identifier:oai:t2r2.star.titech.ac.jp:00015860
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 東京工業大学 : 東京工業大学リサーチリポジトリ