ローカルエピタキシー法によるCoSi_2_/CaF_2_三重障壁共鳴トンネルダイオードの微分負性抵抗特性

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Material Type: 文書・図像類
Title: ローカルエピタキシー法によるCoSi_2_/CaF_2_三重障壁共鳴トンネルダイオードの微分負性抵抗特性
Author/Editor: 渡辺, 正裕
WATANABE, MASAHIRO
金澤, 徹
KANAZAWA, THORU
浅田, 雅洋
ASADA, MASAHIRO
Author Heading: 渡辺, 正裕
WATANABE, MASAHIRO
金澤, 徹
KANAZAWA, THORU
浅田, 雅洋
ASADA, MASAHIRO
Publication Date: 2005-01
Publication Date (W3CDTF): 2005-01
Alternative Title: Negative Differential Resistance of CoSi_2_/CaF_2_ Triple Barrier Resonant Tunneling Diode Grown by Loacl Epitaxy
No. or year of volume/issue: ED2004-227 SDM2004-222
Volume: ED2004-227
Issue: SDM2004-222
Pages: 7-10
Text Language Code: jpn
Target Audience: 一般
Note (General): identifier:oai:t2r2.star.titech.ac.jp:50240099
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 東京工業大学 : 東京工業大学リサーチリポジトリ