ラジカルプロセスに基づく架橋高分子の合成と反応、角岡正弘、白井正充監修、高分子の架橋と分解III

Notes on use

Search by Bookstore

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

Tokyo Tech Research Repository
Paper
You can check the holdings of institutions and databases with which Institutional Repositories DataBase(IRDB)(Institutional Repository) is linked at the site of Institutional Repositories DataBase(IRDB)(Institutional Repository).
Tokyo Tech Research Repository

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 図書
Title: ラジカルプロセスに基づく架橋高分子の合成と反応、角岡正弘、白井正充監修、高分子の架橋と分解III
Author/Editor: 大塚, 英幸
OTSUKA, HIDEYUKI
Author Heading: 大塚, 英幸
OTSUKA, HIDEYUKI
Publication, Distribution, etc.: シーエムシー出版
Publication Date: 2012-07
Publication Date (W3CDTF): 2012-07
Periodical title: 角岡正弘、白井正充監修、高分子の架橋と分解III
Text Language Code: jpn
Target Audience: 一般
Note (General): identifier:oai:t2r2.star.titech.ac.jp:50224968
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 東京工業大学 : 東京工業大学リサーチリポジトリ