Study on the charge trapping phenomena in silicon carbonitride films for nonvolatile semiconductor memory applications

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Study on the charge trapping phenomena in silicon carbonitride films for nonvolatile semiconductor memory applications

Material type: 博士論文

Author: Ahmed Sheikh Rashel Al

Publisher: 東海大学

Publication date: -

Material Format: Digital

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Name of awarding university/degree: 東海大学,博士(工学)

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Material Type: 博士論文
Title: Study on the charge trapping phenomena in silicon carbonitride films for nonvolatile semiconductor memory applications
Author/Editor: Ahmed Sheikh Rashel Al
Author Heading: Ahmed Sheikh Rashel Al
Publication, Distribution, etc.: 東海大学
Alternative Title: 不揮発性半導体メモリへの応用のためのシリコン炭窒化膜の電荷捕獲現象に関する研究
フキハツセイハンドウタイメモリエノオウヨウノタメノシリコンタンチッカマクノデンカホカクゲンショウニカンスルケンキュウ
Degree grantor/type: 東海大学
Date Granted: 2017-09-21
Dissertation Number: 甲第1035号
Degree Type: 博士(工学)
Text Language Code: eng
Subject Heading: nonvolatile memory
silicon carbonitride
charge centroid
charge retention
charge trap center
不揮発性メモリ
シリコン炭窒化膜
電荷重心
電荷保持特性
電荷捕獲中心
Target Audience: 一般
Source: fulltext
https://opac-t.time.u-tokai.ac.jp/iwjs0018opc/bdyview.do?bodyid=TD00000264&elmid=Body&fname=naiyo_k_sheikh_rashel_al_ahmed_201709.pdf
fulltext
https://opac-t.time.u-tokai.ac.jp/iwjs0018opc/bdyview.do?bodyid=TD00000264&elmid=Body&fname=shinsa_k_sheikh_rashel_al_ahmed_201709.pdf
fulltext
https://opac-t.time.u-tokai.ac.jp/iwjs0018opc/bdyview.do?bodyid=TD00000264&elmid=Body&fname=zenbun_k_ahmed_sheikh_rashel_al_20170812.pdf.pdf
Access Restrictions: インターネット公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 東海大学 : 東海大学機関リポジトリ