Growth of Extremely Flat Semiconductor and Superconductor Layers by Liquid-Phase Epitaxy(液相エピタキシャル法による極めて平坦な半導体および超伝導体層の成長)

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Note (General)：: application/pdf博士学位論文の要旨及び審査結果の要旨 (Summary of Thesis(DR))400707 bytes...

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Material Type: 文書・図像類
Title: Growth of Extremely Flat Semiconductor and Superconductor Layers by Liquid-Phase Epitaxy(液相エピタキシャル法による極めて平坦な半導体および超伝導体層の成長)
Author/Editor: Scheel, Hans J.
Author Heading: Scheel, Hans J.
Publication Date: 1994
Publication Date (W3CDTF): 1994
No. or year of volume/issue: 1592
Issue: 1592
Text Language Code: jpn
Target Audience: 一般
Note (General): application/pdf
博士学位論文の要旨及び審査結果の要旨 (Summary of Thesis(DR))
400707 bytes
T2H061592
Format (IMT): application/pdf
Source: T2H061592.pdf
https://tohoku.repo.nii.ac.jp/record/94963/files/T2H061592.pdf
Access Restrictions: 限定公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 東北大学 : 東北大学機関リポジトリ　TOUR