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Development of Chemical Mechanical Polishing Simulator Based on Tight-Binding Quantum Chemical Molecular Dynamics Theory and Its Application to Design of Precision Polishing Processes for Semiconductor Wafers

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Development of Chemical Mechanical Polishing Simulator Based on Tight-Binding Quantum Chemical Molecular Dynamics Theory and Its Application to Design of Precision Polishing Processes for Semiconductor Wafers

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文書・図像類
Author
河口, 健太郎
Publisher
-
Publication date
-
Material Format
Digital
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Note (General)：

博士学位論文の要旨及び審査結果の要旨 (Summary of Thesis(DR))

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Digital

Material Type
文書・図像類
Title
Development of Chemical Mechanical Polishing Simulator Based on Tight-Binding Quantum Chemical Molecular Dynamics Theory and Its Application to Design of Precision Polishing Processes for Semiconductor Wafers
Author/Editor
河口, 健太郎
Author Heading
河口, 健太郎
Alternative Title
強結合量子分子動力学法に基づく化学機械研磨シミュレータの開発と半導体ウェハの精密研磨プロセス設計への応用
No. or year of volume/issue
61
Issue
61
Text Language Code
jpn
Target Audience
一般
Note (General)
博士学位論文の要旨及び審査結果の要旨 (Summary of Thesis(DR))