ケミカルドーピング法を用いた超伝導薄膜のナノエンジニアリング

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22560009

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Material Type: 文書・図像類
Title: ケミカルドーピング法を用いた超伝導薄膜のナノエンジニアリング
Author/Editor: 喜多, 隆介
Author Heading: 喜多, 隆介
Publication, Distribution, etc.: 静岡大学
Publication Date: 2013-05-20
Publication Date (W3CDTF): 2013-05-20
Alternative Title: Nano-engineering of superconducting thin films by chemical-doping method
Text Language Code: jpn
Subject Heading: ナノ構造
人工ピニングセンタ
有機金属塗布法
結晶成長
薄膜
酸化物高温超伝導体
NDC: 431
Target Audience: 一般
Note (General): 2010年度～2012年度科学研究費補助金(基盤研究(C))研究成果報告書
application/pdf
Access Restrictions: 限定公開
Related Material: 22560009
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 静岡大学 : 静岡大学学術リポジトリ