STUDY ON IRRADIATION EFFECTS BY FEMTOSECOND-PULSED EXTREME ULTRAVIOLET IN MAIN-CHAIN SCISSION RESIST

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Note (General)：: 33rd International Microprocesses and Nanotechnology Conference (MNC 2020)

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Summary, etc.：: Femtosecond-pulsed extreme ultraviolet (EUV) of free-electron laser (FEL) is the most potential candidates for a next-generation EUV lithography light...

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Material Type: 文書・図像類
Title: STUDY ON IRRADIATION EFFECTS BY FEMTOSECOND-PULSED EXTREME ULTRAVIOLET IN MAIN-CHAIN SCISSION RESIST
Author/Editor: Hosaka, Yuji
Yamamoto, Hiroki
Ishino, Masahiko
Dinh, Thanhhung
Nishikino, Masaharu
Maekawa, Yasunari
Yuji, Hosaka
Hiroki, Yamamoto
Masahiko, Ishino
Masaharu, Nishikino
Yasunari, Maekawa
Author Heading: Hosaka, Yuji
Yamamoto, Hiroki
Ishino, Masahiko
Dinh, Thanhhung
Nishikino, Masaharu
Maekawa, Yasunari
Yuji, Hosaka
Hiroki, Yamamoto
Masahiko, Ishino
Dinh, Thanhhung
Masaharu, Nishikino
Yasunari, Maekawa
Publication Date: 2020-11-09
Publication Date (W3CDTF): 2020-11-09
Text Language Code: eng
Target Audience: 一般
Note (General): 33rd International Microprocesses and Nanotechnology Conference (MNC 2020)
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 国立研究開発法人量子科学技術研究開発機構 : 量子科学技術研究開発機構学術機関リポジトリ