Study of laser excitation and damage in silicon using Three-Temperature model

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Summary, etc.：: Numerical study of laser excitation in silicon helps in understanding the physical processes during excitation and the consequent onset of damage in t...

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Material Type: 文書・図像類
Title: Study of laser excitation and damage in silicon using Three-Temperature model
Author/Editor: Venkat, Prachi
Tomohito, Otobe
Author Heading: Venkat, Prachi
Tomohito, Otobe
Venkat, Prachi
Tomohito, Otobe
Publication Date: 2022-06-28
Publication Date (W3CDTF): 2022-06-28
Text Language Code: eng
Target Audience: 一般
Note (General): OPTO2022 Symposium
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 国立研究開発法人量子科学技術研究開発機構 : 量子科学技術研究開発機構学術機関リポジトリ