H- Ion Source Using a Localized Virtual Magnetic Filter in the Plasma Electrode: Type I LV Magnetic Filter

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Summary, etc.：: "A new multicusp H^- ion source using a Localized Virtual magnetic filter of type I [Ref.6] in the plasma electrode is investigated. A multipole (MP)...

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Material Type: 文書・図像類
Title: H- Ion Source Using a Localized Virtual Magnetic Filter in the Plasma Electrode: Type I LV Magnetic Filter
Author/Editor: "Oka, Y.
Kaneko, O.
Tsumori, K.
Takeiri, Y.
Osakabe, M.
Kawamoto, T.
Asano, E.
Akiyama, R."
Author Heading: "Oka, Y.
Kaneko, O.
Tsumori, K.
Takeiri, Y.
Osakabe, M.
Kawamoto, T.
Asano, E.
Akiyama, R."
Publication Date: 1999-12-01
Publication Date (W3CDTF): 1999-12-01
Periodical title: Research Report NIFS-Series
ISSN (Periodical Title): ISSN : 0915-633X
Text Language Code: eng
Subject Heading: hydrogen negative ion
ion source
magnetic filter
cesium deposition
NBI
Target Audience: 一般
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 核融合科学研究所 : 核融合科学研究所機関リポジトリ