Laser Crystallization of Non Two-dimensional Silicon Substrate for Thin Film Device Application

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Material Type: 博士論文
Title: Laser Crystallization of Non Two-dimensional Silicon Substrate for Thin Film Device Application
Author/Editor: 菅原, 祐太
Author Heading: 菅原, 祐太スガワラ, ユウタ
Publication, Distribution, etc.: Nara Institute of Science and Technology
Publication Date: 2009-03-24
Publication Date (W3CDTF): 2009-03-24
Alternative Title: レーザー結晶化による非二次元シリコン基板作製とその薄膜デバイス応用
レーザーケッショウカニヨルヒニジゲンシリコンキバンサクセイトソノハクマクデバイスオウヨウ
Degree grantor/type: 奈良先端科学技術大学院大学
Date Granted: 2009-03-24
Dissertation Number: 甲第858号
Degree Type: 博士(工学)
Text Language Code: eng
Subject Heading: thin film transistor
laser annealing crystallization
poly-Si
low-temperature process
Target Audience: 一般
DOI: 10.34413/dr.00858
Format (IMT): application/pdf
Source: fulltext （fulltext）
https://naist.repo.nii.ac.jp/record/11561/files/R007015.pdf
Access Restrictions: 限定公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 奈良先端科学技術大学院大学 : 奈良先端科学技術大学院大学学術リポジトリnaistar