二周波重畳容量結合型フルオロカーボンプラズマ中のイオン挙動解析とシリコン絶縁膜エッチングに関する研究

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Material Type: 博士論文
Title: 二周波重畳容量結合型フルオロカーボンプラズマ中のイオン挙動解析とシリコン絶縁膜エッチングに関する研究
Author/Editor: 久保井, 宗一
Author Heading: 久保井, 宗一
Publication Date: 2024-03-25
Publication Date (W3CDTF): 2024-03-25
Alternative Title: Study on the ion behavior analysis and silicon dielectric films etching in a superimposed dual-frequency capacitively coupled fluorocarbon plasma
Degree grantor/type: 名古屋大学
Date Granted: 2024-03-25
Dissertation Number: 甲第14933号
Degree Type: 博士(工学)
Text Language Code: jpn
Target Audience: 一般
Format (IMT): application/pdf
Source: fulltext
https://nagoya.repo.nii.ac.jp/record/2010162/files/k14933_thesis.pdf
Access Restrictions: インターネット公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 名古屋大学 : 名古屋大学学術機関リポジトリ