文書・図像類

極薄SiC膜を正孔障壁層に用いる新しいエミッタ構造の研究

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極薄SiC膜を正孔障壁層に用いる新しいエミッタ構造の研究

Material type
文書・図像類
Author
佐々木, 公洋ほか
Publisher
-
Publication date
2016-04-21
Material Format
Digital
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金沢大学工学部ECRプラズマCVD成膜法を用い、非晶質SiCより大幅な低低抗化が期待できる微結晶SiCの作製を試みた。400℃という低温プロセス下でも有機シランガス(Si(CH_3)_2H_2)を用いることにより、SiC結晶相を作りだせることが分かった。一方、SiH_4+CH_4ガスを用いた場合、非...

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Material Type
文書・図像類
Title
極薄SiC膜を正孔障壁層に用いる新しいエミッタ構造の研究
Author/Editor
佐々木, 公洋
Sasaki, Kimihiro
Author Heading
佐々木, 公洋
Sasaki, Kimihiro
Publication Date
2016-04-21
Publication Date (W3CDTF)
2016-04-21
Periodical title
平成5(1993)年度 科学研究費補助金 奨励研究(A) 研究概要 = 1993 Research Project Summary
No. or year of volume/issue
1993
Volume
1993
Pages
2p.-