Lubrication Properties of Molybdenum Disulfide Films Deposited by RF Sputtering Method

Material type: 文書・図像類

Author: 西村, 允ほか

Publisher: 航空宇宙技術研究所

Publication date: 1986-03

Material Format: Digital

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Note (General)：: An RF sputtering apparatus with a pair of targets has been developed for depositing a film of uniform thickness onto a complex-geometric specimen such...

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Material Type: 文書・図像類
Title: Lubrication Properties of Molybdenum Disulfide Films Deposited by RF Sputtering Method
Author/Editor: 西村, 允
野坂, 正隆
鈴木, 峰男
関, 勝美
宮川, 行雄
NISHIMURA, Makoto
NOSAKA, Masataka
SUZUKI, Mineo
SEKI, Katsumi
MIYAKAWA, Yukio
Author Heading: 西村, 允
野坂, 正隆
鈴木, 峰男
関, 勝美
宮川, 行雄
NISHIMURA, Makoto
NOSAKA, Masataka
SUZUKI, Mineo
SEKI, Katsumi
MIYAKAWA, Yukio
Publication, Distribution, etc.: 航空宇宙技術研究所
Publication Date: 1986-03
Publication Date (W3CDTF): 1986-03
Alternative Title: 高周波スパッタリング法による二硫化モリブデン膜の潤滑特性に関する研究
Periodical title: 航空宇宙技術研究所報告 = Technical Report of National Aerospace Laboratory TR-903
No. or year of volume/issue: 903
Volume: 903
Pages: 57-
ISSN (Periodical Title): ISSN : 0389-4010
Text Language Code: eng
Target Audience: 一般
Note (General): An RF sputtering apparatus with a pair of targets has been developed for depositing a film of uniform thickness onto a complex-geometric specimen such as the retainer of a ball bearing. The deposition characteristics of the apparatus were compared with those of the conventional sputtering apparatus. Lubrication properties of MoS2 films made by these devices were also compared under a variety of conditions. Finally, friction and wear of MoS2 films applied to angular-contact type ball bearings of 20 mm bore were studied in air, nitrogen and vacuo. The two-target sputtering has an advantage mentioned above, however, the films deposited by the method exhibited a rather short wear life because of the temperature rise of the substrate during ion bombardment and during the sputtering process. This temperature dependence was observed in films on those substrates that had been heated with a built-in heater during sputtering. The film thickness measurement and the observation by a SEM showed this was attributed to the porous growth of films. Thus substrates should be kept at low temperatrues when one wants to obtain an MoS2 film of high quality. As a whole, sputtered MoS2 films are an excellent lubricant under sliding contact as well as rolling contact conditions in regard to friction force and endurance life.
資料番号: NALTR0903000
レポート番号: NAL TR-903
Source: https://jaxa.repo.nii.ac.jp/?action=repository_action_common_download&item_id=45162&item_no=1&attribute_id=31&file_no=1
https://jaxa.repo.nii.ac.jp/?action=repository_action_common_download&item_id=45162&item_no=1&attribute_id=31&file_no=1
Access Restrictions: 限定公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 宇宙航空研究開発機構 : 宇宙航空研究開発機構リポジトリ