水素イオン注入により発生したシリコン結晶内プレートレットのTEM観察

Material type: 文書・図像類

Author: 岩田, 博之ほか

Publisher: 愛知工業大学

Publication date: 1999-06-30

Material Format: Digital

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Note (General)：: A damaged layer formed by high dose hydrogen implantation into a silicon wafer has been observed with cross sectional Transmission Electron Microscopy...

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Material Type: 文書・図像類
Title: 水素イオン注入により発生したシリコン結晶内プレートレットのTEM観察
Author/Editor: 岩田, 博之
金森, 栄次
高木, 誠
徳田, 豊
井村, 徹
Author Heading: 岩田, 博之
金森, 栄次
高木, 誠
徳田, 豊
井村, 徹
Publication, Distribution, etc.: 愛知工業大学
Publication Date: 1999-06-30
Publication Date (W3CDTF): 1999-06-30
Alternative Title: スイソイオン　チュウニュウ　ニヨリ　ハッセイ　シタ　シリコン　ケッショウ　ナイ　プレートレット　ノ　TEM　カンサツ
TEM Observation of the Platelets in Hydrogen Implanted Silicon
Periodical title: 総合技術研究所研究報告=Bulletin of Research Institute for Industrial Technology.
No. or year of volume/issue: 1
Volume: 1
Pages: 31-35
ISSN (Periodical Title): ISSN : 1344-9672
Text Language Code: jpn
Target Audience: 一般
Note (General): A damaged layer formed by high dose hydrogen implantation into a silicon wafer has been observed with cross sectional Transmission Electron Microscopy Q(TEM). Hydrogen ions were implanted into n-type (100) silicon at 80keV with a dose of 1.0x10^<17> atoms/cm^2. Four kinds of major defects, i.e., (1)～(4) observed as in the following, are investigated; (1) point-like defects existing broadly between surface and projection range (Rp), (2) (100)platelets existing around the Rp, (3) (111)platelets existing in the deeper region than the Rp, (4) dislocation-like loops in the region deeper than the damaged layer. In the sample with lower implantation dose, i.e., 8.0x10^<16> atoms/cm^2, the dislocation loop was not observed. After 300℃ annealing, cracks were observed at the Rp. After 475℃ annealing, the (111)platelets disappeared. In addition, the depth profile of hydrogen distribution was measured by Secondary lon Mass Spectroscopy (SIMS). Si-H bond condition was investigated by Fourier Transform Infrared spectroscopy (FTIR). Comparing those results with the results obtained by XTEM, it is found that the point defects and platelets contain hydrogen atoms, and (111)platelets involve Si_2-H_6 bond.
identifier:http://repository.aitech.ac.jp/dspace/handle/11133/1568
Format (IMT): application/pdf
Source: http://repository.aitech.ac.jp/dspace/bitstream/11133/1568/1/%e7%b7%8f%e7%a0%941%e5%8f%b7%28P31-35%29.pdf
http://repository.aitech.ac.jp/dspace/bitstream/11133/1568/1/%e7%b7%8f%e7%a0%941%e5%8f%b7%28P31-35%29.pdf
Access Restrictions: 限定公開
Data Provider (Database): 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
https://irdb.nii.ac.jp
Original Data Provider (Database): 愛知工業大学 : 愛知工業大学学術情報リポジトリ